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日本YAMATO等离子清洗机PR1000
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产品名称:
日本YAMATO等离子清洗机PR1000
产品型号:
PR1000
产品展商:
安捷来国际股份（香港）有限公司
简单介绍
中型等离子清洗机PR1000
日本YAMATO等离子清洗机PR1000的详细介绍
| Plasma Mode | | DP | | DP:DirectPlasma | | Radio-FrequencyOutput | | 10to1000W | | Oscillating Frequency | | 13.56MHz | | ChamberSize(mm) | | ø300X500D |
| Barreledtypelargeglass chamber EquipmentSummary
ThisPlasma cleaner is made up composed ofasfollows; - Reaction chamber
- Matching box fortakingadjustbetween
- load and RF power
- Reaction gasflowsystem(CF4 and O2)
- PLC controllerwithTouchpanel
- Radio-frequencypowersupply(RF)
- Vacuum pump
- Purge gas system (N2)
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| Specifications |
| Model | PR-1000 |
|---|
 MainUnit | | Chambersize | ø300×500(D)mm | | Chambermethod | Quartzglass | | Electrode | Condenser(4division) | | Plasmamode | DP mode | | Vacuumgauge | Capacitancemanometer T | | Reactiongas system | wosystem(CF4, O2) | | Maincontroller | PLCcontroller | | Display | LCDcolordisplayand Touch panel (5.7 inch) | | Door | Manualopen,swingtype | | ExternalDimension | 700(W)×820(D)×1600(H)mm | | Radio-FrequencyPower Supply | | Inputvoltage | AC200V8A50/60Hz | | Radio-frequency output power | 10 to1000W | | Referenceoscillator | Quartzoscillator | | Oscillating frequency | 13.56MHz | | Outputsetting system | Digitalsetting | | Matchingadjustment | Automatictuning | | VacuumPump | | Displacement | 670L/min. | | Inputpower supply | 3 phaseAC200V11A50/60Hz | | InletConfiguration | NW40 | | OutletConfiguration | NW40 | | GasSystem | | Purgegas | N2 | | Reactiongas control | Massflowcontroller CF4 (F.S.300sccm)
O2 (F.S.300sccm) |  System Protectionof Equipment | - Protect over current,Builtinprotect over current of Vacuum pump, RF power supplyandmainunit
- Protect quartzoscillator,Whenmatching unit have miss matching, Automatic RF powerdownandprotect quartz oscillator
- Door panel inter lock, Builtininterlock switch
- External coversafetylockswitch
- Emergency stop switch
| | SystemProtections by Software in PLC | When occurredfollowingconditions,Equipment stop and Error will display. - In case of RF power is outofsettingvalue.
- In case of gas flow (CF4, O2) is out of setting flow rate.
- In case of RFW powerisoverpermission value.
- In case of Vacuum pressuredoesnotreach within setting time.
- After finish plasmaprocess,chamberdoes not become atmosphere.
| | Utility | | Electricpower supply | 3 phaseAC380V20A50/60Hz (Total system) with down transformer | | CF4 gas | 0.15to0.25Mpa | | O2 gas | 0.15to0.25Mpa | | PressureAir | 0.4 to0.6Mpafordriving air valve | | Connectingsize | 1/4swagelok |
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