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日本YAMATO等离子清洗机PR500/510
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产品名称:
日本YAMATO等离子清洗机PR500/510
产品型号:
PR500/PR510
产品展商:
YAMATO
产品文档:
无相关文档
简单介绍
日本YAMATO等离子清洗机PR500/510
小型等离子清洗机PR500/PR510，广泛被应用在半导体材料的灰化、蚀刻、干式清洗等方面，外形小巧，价格经济
日本YAMATO等离子清洗机PR500/510的详细介绍
日本YAMATO等离子清洗机PR500/510：
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Gas Plasma Etcher
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PR500/PR510
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Model
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500
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510
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Method
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Barrel type of DP
DP : direct plasma
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High-frequency Output
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Max.500W
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Oscillating Frequency
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13.56MHz
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Reaction Chamber
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ø215×305mm
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The PR500/510 isagasplasma device that is used widely for such applicationsasproductionof semiconductors and analysis work. Itboastsoutstandingoperability and safety, with an automatic tuningsystemas a standardcomponent and other features.
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It has a compact design,withasmall-size HF generator and an oscillation sectionintegratedwitha portion of the chamber.
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With the 215mm diameterlargecaliberchamber, the unit can process bigtestingsamples.
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 The gas plasmaequipment has a wide range ofapplications fromashing, etching,dry cleaning,etc.
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 Operation Flowchart
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 Piping System Diagram
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Specifications
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Model
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PR500
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PR510
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 Method
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Barrel type of direct plasma
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Controlpart
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Highfrequency output
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Max.500W
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Oscillating frequency
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13.56MHz
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Outputimpedance
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50Ω
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Tuningmethod
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Automatic tuning
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Instrument
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Output watt meter (0 to 600W)
Reflected wave watt meter (0 to 300W)
Vacuum gauge, thermocouple type
Flow meter, needle valve integrated type, 2 sets
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Timer
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0.1sec. to 999h
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Gasinlet
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1/4"stainless steel, 2 inlet
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Powersource (50/60Hz)
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AC100/220V, single phase, 2 kVA
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Reactionpart
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Reactionchamber
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Madeof quarts, φ215×305mm
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Electrodestructure
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Condenser type, 4-way split
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Controlsystem
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Autopressurereduction, auto leak valve
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TouchpanelwithPLC control
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Pipingmaterial
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SUS,Teflon
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Externaldimensions(W×D×Hmm)
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438×520×760
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520×630×760
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Weight
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Approx.38kg
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Approx.60kg
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StandardAccessories
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Connection cable :1completeset
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Vacuum grease : 1 pc.
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O-ring for reaction chamber:1pc.
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OptionalAccessories
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Frame for wafers, 2, 3,4,5, 6 inches Multipurposeangledframe
Aluminum etchingtunnelStand
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