From experimental usage to mass production, various equipment configuration is available
Batch:25 to 150 wafers processing is available
1 to 4 stacks furnace configuration is implemented for taking advantage of limited square available
2 to 8 inch and 300mm wafer size are available
LGO heater for Low and medium high temperature, HGC heater for high temperature are provided for excellent temperature performance
Proposing equipment configuration according to the customer’s needs based on usage, space, and budget
Simple and well equipped control system