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对应300mm Wafer的小型立式炉
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产品名称:
对应300mm Wafer的小型立式炉
产品型号:
VF-5900
产品展商:
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简单介绍
对应300mm Wafer的小型立式炉Large batch, Max 100 wafers batch processing
Max 16 FOUP stocksExcellent temperature control from low to medium high temperature range by use of LGO heater
对应300mm Wafer的小型立式炉的详细介绍
对应300mm Wafer的小型立式炉:

Large batch, Max 100 wafers batch processing
Max 16 FOUP stocks
Excellent temperature control from low to medium high temperature range by use of LGO heater
High-speed wafer transfer by use of single/five wafers handling robot
Equipped with operator friendly high performance control system
Outer dimension | | W1250×D3200×H3400mm |
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Heater | LGO heater(ID ø500mm) |
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Flat zone length | 1040mm |
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Wafer size | 300mm |
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Batch size | 100wafers |
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I/O port | 2 |
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Number of FOUP stock | 16(standard) |
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Finger | 5wafers+single wafer |
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Controller | Model VSC1000 |
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Option | Forced-cooling system, N2 load lock, HOST communication(GEM300) |
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